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Measurements of Si & O self-diffusion coefficients in silicate minerals

(a) Polish the sample surface

(Sand paper, diamond powder, alkaline colloidal silica solution, etc.)

(b) Deposite isotopically enriched thin film on the polished surface

(Pulsed laser deposition, RF Sputter, etc.)

(c) Anneal at high temperature

(Multi-anvil press, piston cylinder, ambient pressure furnace, etc.)

(d) Obtain diffusion profile

(SIMS, RBS, etc.)